The Microfabrication laboratory has a set of equipment that allows depositing and removing metallic and dielectric thin films, in addition to an oven for thermal treatments. It has a sputtering equipment (Alliance Concept, AC450) capable of depositing metallic films such as Al, Ti, Cu, Cr and Au (DC magnetron sputtering) and dielectrics such as SiO2, Si3N4, Si, Al2O3 (RF sputtering). An Oxford Plasma Pro100 Cobra plasma etching equipment powered by 8 different gases capable of etching metals (CL2 and HBr gases) and dielectrics (SF6, CHF3, C4F8, He, Ar and O2 gases). A rapid thermal annealing furnace (JetFirst 200 C) capable of reaching up to 1,100 °C. Photolithography and microfabrication laboratory equipment are capable of processing wafers of 4, 6 and up to 8 inches in diameter.